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論文・学会資料

論文資料	「論文」 1. 表面処理のための大気圧直線型マイクロ波プラズマ(進藤春雄、桑畑周司、磯村雅夫、解説、日本真空学会誌, 60, 105 (2017))., , 2. A New Floating-Probe for Measurement of Insulated Plasma Produced by Radio-Frequency Power(Y. Taniuchi, T. Yamada, M. Isomura and H. Shindo, Jpn. J. Appl. Phys., 51, 116101 (2012))., , 3. Silicon Trench Oxidation in Downstream of Microwave Oxygen Plasma (S. Takahashi and H. Shindo, Jpn. J. Appl. Phys., 50, 066201 (2011)). 4.大規模マイクロ波ラインプラズマの開発（小特集論文）(進藤春雄、プラズマ核融合学会誌　８７巻、NO.1　PP18－23(2011) 5. A New Method of Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide(Y.Kimura, H.Kawaguchi, S.Kagami, M.Furukawa and H.Shindo, Applied Physics Express, 2, 126002-1-126002-3 (2009)) 6. Mode Transition Enhancement by Permittivity of Window Materials in Low Frequency Plasmas, Y.Jimbo, Y.Kitamura, K.Kusaba, M.Kikuchi and H.Shindo, 016001 2009 (学術雑誌) 10,1143/APEX.2.016001 7. A New Emissive Probe Method to Measure the Electron Temperature in Radio-Frequency Plasmas, K.Kusaba, H.Shindo, Review of Scientific Instruments, 78/12, 123503-1 2007 (学術雑誌) 8. High Aspect Ratio SiO_2 Etching with Hgih Resist Selectivity Improved by Addition of Organicisilane to Tetrafluoroethyl Frifluoromethyl Ether (HFE 227) [in Japanese], CHINZEI Yasuhiko , OZAWA Masanori , KIKUCHI Toshiaki , HORIOKA Keiji , SHINDO Haruo , ICHIKI Takanori , HORIIKE Yasuhiro, Journal of the Vacuum Society of Japan 41(8), 685-691, 1998-08-20
学会資料	「国際学会」　　　　 1.High-Aspect Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma(Y. Taniuchi and H. Shindo, Proc. Of 58th International Symposium of American Vacuum Society, Nashville, USA, P80-80 (2011)) 2.Large-Scaled ECR Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide(H. Shindo, Y. Kimura and T. Hirao, Proceedings of 18th International Conference on Gas Discharges and Their Applications, Greifswald, Germany, pp.422-425 (2010)). 「国内学会」 1.新しいプラズマ源と診断法の研究、進藤春雄、第61 回応用物理学会春季学術講演会　講演予稿集18a-E9-1（2014 春　青山学院大学）
技術資料に関する　　　　　　　　　お問い合わせ先	TEL : 046-250-7557　　　E mail : shindo-h@zpost.plala.or.jp

論文資料

「論文」

1. 表面処理のための大気圧直線型マイクロ波プラズマ(進藤春雄、桑畑周司、磯村雅夫、解説、日本真空学会誌, 60, 105 (2017))., ,

2. A New Floating-Probe for Measurement of Insulated Plasma Produced by Radio-Frequency Power(Y. Taniuchi, T. Yamada, M. Isomura and H. Shindo, Jpn. J. Appl. Phys., 51, 116101 (2012))., ,

3. Silicon Trench Oxidation in Downstream of Microwave Oxygen Plasma (S. Takahashi and H. Shindo, Jpn. J. Appl. Phys., 50, 066201 (2011)).

4.大規模マイクロ波ラインプラズマの開発（小特集論文）(進藤春雄、プラズマ核融合学会誌　８７巻、NO.1　PP18－23(2011)

5. A New Method of Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide(Y.Kimura, H.Kawaguchi, S.Kagami, M.Furukawa and H.Shindo, Applied Physics Express, 2, 126002-1-126002-3 (2009))

6. Mode Transition Enhancement by Permittivity of Window Materials in Low Frequency Plasmas, Y.Jimbo, Y.Kitamura, K.Kusaba, M.Kikuchi and H.Shindo, 016001 2009 (学術雑誌) 10,1143/APEX.2.016001

7. A New Emissive Probe Method to Measure the Electron Temperature in Radio-Frequency Plasmas, K.Kusaba, H.Shindo, Review of Scientific Instruments, 78/12, 123503-1 2007 (学術雑誌)

8. High Aspect Ratio SiO_2 Etching with Hgih Resist Selectivity Improved by Addition of Organicisilane to Tetrafluoroethyl Frifluoromethyl Ether (HFE 227) [in Japanese], CHINZEI Yasuhiko , OZAWA Masanori , KIKUCHI Toshiaki , HORIOKA Keiji , SHINDO Haruo , ICHIKI Takanori , HORIIKE Yasuhiro, Journal of the Vacuum Society of Japan 41(8), 685-691, 1998-08-20

学会資料

「国際学会」　　　　

1.High-Aspect Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma(Y. Taniuchi and H. Shindo, Proc. Of 58th International Symposium of American Vacuum Society, Nashville, USA, P80-80 (2011))

2.Large-Scaled ECR Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide(H. Shindo, Y. Kimura and T. Hirao, Proceedings of 18th International Conference on Gas Discharges and Their Applications, Greifswald, Germany, pp.422-425 (2010)).

「国内学会」

1.新しいプラズマ源と診断法の研究、進藤春雄、第61 回応用物理学会春季学術講演会　講演予稿集18a-E9-1（2014 春　青山学院大学）

　　技術資料に関する　　　　　　　　　お問い合わせ先　　　　　　　　　　

　TEL : 046-250-7557　　　E mail : shindo-h@zpost.plala.or.jp